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LABStar
- -Type : Basic R&D model for large-area etching & deposition
- -Load lock : Manual load system
- -Substrate (Wafer) size : up to 460 mm
- -Available system type : RIE, ICP, PECVD
- -Available Wafers :
- 4″ × 16 wafers
- 6″ × 9 wafers
- 12″ × 1 wafer (up to 16 wafers)